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Case details

Case Number: App_475291/2023

  • Patent number:
    EP3196336 - HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS

  • Proceeding type: Application

  • Action/Application: Inanspruchnahme der Ausnahmeregelung

  • Applicants:
    Clarivate Represented by Iva Matkovic

  • Court Division: appealInstance - seat - Luxembourg

  • Date of Formal receipt: 2023-06-02 19:53:45